Rapid etching X-rayed

23.01.2015

A breakthrough in the study of chemical reactions during etching and coating of materials was achieved by the research group of Olaf Magnussen at the Institute of Experimental and Applied Physics. In collaboration with staff from the European Synchrotron Radiation Facility ( ESRF) in Grenoble, France the team succeeded for the first time in observing atomic-scale behaviour at material surfaces under industrial conditions. For this, the changes in the atomic arrangement at the material's surface were monitored by X-ray diffraction, which required increasing the speed of the measurements more than a hundredfold as compared to previous studies. The results appear as the cover feature in the current issue (23.3.2011) of the renowned Journal of the American Chemical Society.